+86 185 3080 3982

PVD Coating Machine

Home - Products - PVD Coating Machine - Ultrahigh-Vacuum Field-Emission Cathode Property Detect System

Ultrahigh-Vacuum Field-Emission Cathode Property Detect System

This facility is designed for emission detection on nanostructures and other materials, by detailed analysis of the open voltage, threshold voltage, and field emission stability of measured samples. For long, we have designed such facilities for famous universities and institutes (such as Tsinghua university, Sun Yat-sen university and Institute of Metal research, CAS, et al), and gained much successful experience on design of such facility according to the special requirement from customers.


Technical Parameters

Structural Feats:

1) separated sample transferring chamber and analysis chamber fa ciliate the vacuum maintenance, which is time saving.

2) ultimate vacuum up to 10-7Pa, which insured the reliability of measurement.

3) samples can be heated up to 600°C for temperature dependent measurement.

4) electrode distance can be adjusted precisely by a micrometer caliper.

5)automatic data acquisition facilitates the long term measurements and lifetime measurements.

6) All the detect instruments are made in USA, stable and reliable.


Specifications:

Ultimate Vacuum

i)analysis chamber 8×10-9Pa;

ii) pre chamber 8×10-7Pa; pre chamber is equipped with by-pass pumping, and it takes only 5 minutes from air to ultrahigh vacuum; the measurement precision is 0.001-0.01mm.

Field Emission MeasurementCan be down at temperature range from RT to 500°C, with ±1°C control precision.
Ion Gun for Sample PreconditioningDigital vacuum gauge for vacuum measurement, glass view port for observation. I-T and I-V can be given simultaneously.
Sample HolderTemperature range from LHe to 500°C; sample size 1cm×1cm; withstand voltage 10KV.
Electron GunEnergy 0-10KeV. maximum beam current 1mA.
Ion GunEnergy 0-10KeV, maximum beam current 80mA.
Plasma GeneratorInstalled in pre-chamber, RF power supply 500W.
UV Light Sourceλ=365±2nm, illuminating area 3×3mm2, intensity at center 4500MW/cm2.
Visible Light SourceXenon lamp, stability≤1%, illuminating area Ø50mm.
Gas LineControlled with mass flowmeter, pressure range 50-10-7Pa.