Home - Products - PVD Coating Machine - thin film materials Lab Pulsed Laser Deposition (PLD system)
Dual chamber pulse laser coater is used for growing optical crystals, ferroelectrics, ferromagnets, superconductors and organic compound thin film materials, suitable for growing high melting point, multi-elements and complex layered superlattice thin film materials containing gas elements.
Technical Parameters
Product Description:
Dual chamber pulse laser coater is used for growing optical crystals, ferroelectrics, ferromagnets, superconductors and organic compound thin film materials, suitable for growing high melting point, multi-elements and complex layered superlattice thin film materials containing gas elements. It is widely used in the research and manufacture of thin film materials in colleges and universities.
(Support customization, including accessories and consumables, please contact our staff for details.)
Technical Parameters:
| Model | KS-PLD450 | |
| Main vacuum system | Sphere structure, size: dia. 450mm | |
| Loading sample system | Vertical cylindrical stucture, size: dia. 150×150mm | |
| Vacuum system configuration | Main vacuum chamber | Mechanical pump, molecular pump, valve |
| Loading sample system | Mechanical pump and molecular pump(sharing with primary chamber), valve | |
| Ultimate pressure | Main vacuum system | ≤6*10-6Pa(after baking and degassing) |
| Loading sample system | ≤6*10-3 Pa(after baking and degassing) | |
| Vacuum recovery system | Main vacuum system | It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) |
| Loading sample system | It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) | |
| Rotating target platform | The maximum size of the target is about 60mm. Four target materials can be installed at one time, target changing in revolution motion; each target can rotate independently, rotation speed: 5-60 rpm | |
| Substrate heating platform | Sample size | Dia. 51 |
| Mode of motion | Substrate rotates continuously, rotation speed:5-60 rpm | |
| Heating temperature | Maximum temperature of substrate heating: 800℃±1℃, Controlled and adjustable | |
| Gas circuit system | 1-circuit mass flow controller, 1-circuit inflation valve | |
| Optional accessories | Laser device | Compatible with coherent 201 laser |
| Laser beam scanning device | 2D scanning mechanical platform, perform two degree of freedom scanning. | |
| Computer control system | The contents of control include common conversion target, target rotation, sample rotation, sample temperature control, laser beam scanning, etc. | |
| Floor Space | Main unit | 1800 * 1800mm2 |
| Electric cabinet | 700 *700mm2(one) | |
