Equipment Application:
This system is a high-vacuum multifunctional ion beam deposition system. The system can be used to develop nano-scale single-layer and multi-layer functional films and composite films-metallized, alloy, Compound, semiconductor, dielectric composite film, etc. It is widely used in the scientific research and small batch preparation of thin film materials in universities and research institutes.
Technical Parameters
Equipment composition:
The system is mainly composed of deposition chamber, Kaufman sputtering ion source, Kaufman cleaning auxiliary ion source, sample stage, sample heating device, film thickness monitoring system, pump.
It is composed of pumping system, vacuum measuring system, gas circuit system, electric control system, etc.
Technical Parameters:
1. Ultimate vacuum: ≤8.0×10-5Pa (after baking and degassing);
2. Leak rate of system vacuum leak detection: ≤5.0×10-8Pa.L/S; shutdown for 12 hours ≤5Pa.
3. After the system is exposed to the atmosphere for a short time and filled with dry nitrogen, it will start pumping again, which can reach 6.6×10-4Pa in 45 minutes;
4. The system is mainly composed of an evaporation vacuum chamber, an E-type electron gun, a thermal evaporation electrode, a rotating substrate heating table, a working gas path, an air extraction system,It is composed of vacuum measurement, installation machine and electric control system.
