Home - Products - PVD Coating Machine - Multifunctional high vacuum magnetron sputtering evaporation coating instrument
KS-1HD-EVP High vacuum magnetron sputtering evaporation coating equipment is a multifunctional high vacuum coating equipment. The single target magnetron sputtering equipment can be used to prepare single or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc.
Technical Parameters
Product Description:
KS-1HD-EVP High vacuum magnetron sputtering evaporation coating equipment is a multifunctional high vacuum coating equipment. The single target magnetron sputtering equipment can be used to prepare single or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc. This machine is equipped with a vapor deposition heating boat, which is particularly suitable for vapor deposition of metal films that are sensitive to oxygen (such as Ti, Al, Au, etc.). There is a rotatable baffle above the heating boat.
Technical Parameters:
| Vacuum chamber | Chamber size | φ324×330 mm |
| Ultimate vacuum | 8.0×10⁻⁵ Pa (molecular pump system) | |
| Leak rate | 2.0×10⁻¹⁰ Pa·m³/s | |
| Material | Welded 304 stainless steel, electrochemical surface polishing | |
| Sealing (movable parts) | Rubber sealing ring | |
| Sealing (fixed parts) | Copper sealing ring | |
| Drive mechanism | Magnetic coupling drive | |
| Components | 1 magnetron target position, 1 set of evaporation electrodes (2 pcs), 2 beam source positions (1 beam source standard) | |
| Gas flow meter | 1 set (argon), with φ150 glass observation window | |
| Reserved port | C35 flange | |
| Sputtering target head | Target size | 2 inch (φ50.8 mm) |
| Working pressure | 10 Pa to 0.2 Pa | |
| Target utilization rate | >35% (standard 3mm copper target at 0.5 Pa) | |
| Max power | <240 W (with sufficient cooling) | |
| Insulation voltage | >2000 V (with 500 W DC power supply) | |
| Resistance Evaporation | Output voltage | AC 0–8 V continuously adjustable |
| Max evaporation current | 200 A | |
| Max evaporation power | <1.6 kW | |
| Temperature control | Not controllable, not measurable | |
| Beam source furnace | Crucible capacity | 3 cc |
| Heating temperature range | Room temperature – 700°C | |
| Temperature control | Measurable, adjustable, controllable | |
| Temperature control accuracy | ±0.5°C | |
| Crucible type | Standard quartz crucible, with baffle and thermocouple | |
| Power supply | 500 W, 36 V |
