The utility model KS-PS900 has comfortable hand feeling, strong practicability, easy implement, novel construction, simple structure. The micro leakage valve on the front panel can connect various gases; The sputtering current is regulated, the film speed is fast and the quality is good. Functional control and timing are all scheduled by CPU, with a wide range of applications. It is easy to control the vacuum chamber pressure, ionization current and choose the required ionization gas when working in conjunction with the internal automatic control circuit, so as to achieve the best coating effect.
Technical Parameters
| Model | KS-PS900 |
| Host size | L360mm*W300mm*H380mm |
| Target (upper electrode) | Diameter 50mm, thickness 0.1mm |
| Vacuum sample chamber | Diameter 160mm,height 120mm |
| Sputtering area | Ф50mm |
| Vacuum degree | ≤4X10-2mbar |
| Lon ammeter | Max 50mA |
| Timer | Max 3600S |
| Micro vacuum gas valve | Can connect with φ3mm soft pipe |
| Gas available | Multiple gas available |
| Max voltage | -1600DCV |
| Mechanical pump rate | 2L/S |
