Home - Products - PVD Coating Machine - High vacuum perovskite glove box evaporation coater for metal and organic thin films
KS-PVD-PEVP The high vacuum perovskite glove box evaporation system is a heating coating method that uses resistance heating to vaporize and evaporate the film material and then condense it on the substrate to form a film.
Technical Parameters
Product Description:
KS-PVD-PEVP The high vacuum perovskite glove box evaporation system is a heating coating method that uses resistance heating to vaporize and evaporate the film material and then condense it on the substrate to form a film. This method is simple in structure, practical, and reliable in use. It is suitable for preparing metal single-element thin films, semiconductor thin films, oxide thin films, organic thin films, etc. It can be used in scientific research units to conduct research on new materials and new process thin films, and can also be used for test work before mass production.
The perovskite evaporation system is equipped with 6 sets of evaporation sources, which can switch to 6 materials at most, and can also evaporate 2 materials at the same time, such as Cu, Ag, PbI2, CsBr, etc. The equipment can be docked with the glove box for easy operation in the glove box, and adopts a front sliding door structure. This series of equipment is widely used in teaching, scientific research experiments in colleges and universities, scientific research institutes, and early exploratory experiments and new product development of production-oriented enterprises.
Scope of application: device preparation of perovskite materials, two-dimensional materials, photovoltaic solar cells, etc.
Technical Parameters：
| Product name | High vacuum perovskite glove box evaporation coater |
| Product model | KS-PVD-PEVP |
| Vacuum Chamber Size | Width 400mm × Depth 400mm × Height 450mm |
| Chamber Structure | Vertical front and rear doors; manual front door with dual guide rails; rear door with manual hinge |
| Chamber Material | 304 stainless steel, polished inside and out, detachable internal liner |
| Observation Windows | One 4-inch window on front door, two small windows on rear door, all with anti-fouling glass |
| Evaporation Sources | 2 metal sources + 4 organic sources |
| Sample Stage Structure | Drawer-type, supports samples up to 150×150mm |
| Sample Stage Adjustment | Electrically adjustable height 0–60mm, rotation speed 0–30 rpm, water-cooled |
| Vacuum Pump Configuration | 1200 L/S turbomolecular pump + mechanical pump, with DN200 pneumatic main valve |
| Ultimate Vacuum | Better than 2.0×10⁻⁵ Pa |
| Leak Rate | Better than 5×10⁻⁸ Pa·L/S |
| Pumping Time | From atmosphere to 5×10⁻⁴ Pa within 20 minutes (in dry nitrogen environment) |
| Vacuum Retention | ≤ 5 Pa after 12 hours of shutdown |
| Evaporation Power Supply (Metal) | 2.4 kW, supports constant current/voltage modes and PID closed-loop control |
| Evaporation Power Supply (Organic) | 4 sets of 20–10 power supplies, temperature range 0–700°C, with temperature display |
| Film Thickness Control | Supports PID automatic adjustment of evaporation rate |
| Control System | PLC + touch screen, manual/automatic switchable, supports input of rate and final thickness |
| Interlock & Protection | Comprehensive alarms and protections for water shortage, undervoltage, temperature, phase sequence, vacuum, etc. |
