CVD system with multi channel float flow meter for nanomaterias

Product Description:

Chemical vapor deposition (CVD) refers to the method of chemical gas or vapor reacting on the surface of the substrate to synthesize coatings or nanomaterials. It is a very widely used technology for depositing thin film materials in the semiconductor industry, including a wide range of insulating materials and Most metal materials and metal alloy materials. For this reason, we have developed a complete set of CVD coating systems, which are suitable for the fields of materials laboratories, scientific research institutes, environmental sciences and other fields of major universities.

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