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13.56Mhz plasma cleaner with 4L capacity for silicon wafers


KS-PL-4M plasma cleaning machine has stable performance, high cost performance,

It has the characteristics of simple operation, extremely low cost of use and easy maintenance. for various

Metals, ceramics, glass, silicon wafers of any shape and surface roughness,

Ultra-cleaning and modification of the surface of plastic and other objects to completely remove samples Organic pollutants on product surfaces.

Technical Parameters

Product   Model KS-PL-4M
External   dimensions 480mm*380mm*420mm
Vacuum   chamber size stainless steel chamber, φ150mm*230mm deep
Electrode   size 95*170mm, multi-control adaptive flat   electrode,
Plasma   generator 13.56MHz dedicated plasma source;
Frequency 40kHz (optional); adaptive impedance   matching power supply
Power 0-200W continuously adjustable, precision 1W
Vacuum   gauge thermocouple vacuum gauge 0-100KPa
Gas   supply 1 gas channel, precise needle valve control   (can be equipped with a second gas channel)
Control   method 4.3-inch touch screen, multi-level   application menu, easy and fast operation